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Morphological, structural, and photoelectrochemical characterization of n-type Cu2O thin films obtained by electrodeposition

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Autor Grez P.
Autor Herrera F.
Autor Riveros G.
Autor Ramirez A.
Autor Henriquez R.
Autor Dalchiele E.
Autor Schrebler R.
Fecha Ingreso 2014-04-05T00:17:53Z
Fecha Disponible 2014-04-05T00:17:53Z
Fecha en Repositorio 2014-04-04
dc.identifier 10.1002/pssa.201228286
dc.description.abstract Thin films of copper(I) oxide (Cu2O) were electrodeposited on fluorine-doped tin oxide predeposited glass substrates, by reduction of Cu 2+ from Cu(II) acetate acid aqueous solutions. The Cu2O was potentiostatically grown at a potential value of -0.450V (vs. SMSE) at 70°C. The Cu2O thin films were characterized by means of scanning electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy (XPS), optical transmission, electrochemical impedance spectroscopy, and photoelectrochemical experiments. Through these techniques, it was possible to establish the cubic Cu2O phase with a high crystallinity and a strong preferential growth along the [200] and [220] directions. Cu2O thin films show oxygen vacancies with formation of a nonstoichiometric compound with the presence of Cu(0) in the crystal lattice as determined by XPS analysis. In addition, Cu2O was used as the photoanode for the I- oxidation reaction when the system was illuminated (Φ0=50. 0mWcm-2). The films exhibited a clear n-type semiconductor behavior, which was in agreement with the Mott-Schottky results. This behavior was explained by considering the nonstoichiometry of the oxide. Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. en_US
dc.source Physica Status Solidi (A) Applications and Materials Science
Link Descarga dc.source.uri
Title dc.title Morphological, structural, and photoelectrochemical characterization of n-type Cu2O thin films obtained by electrodeposition en_US
Tipo dc.type Article
dc.description.keywords Fluorine doped tin oxide; Glass substrates; High crystallinity; Mott-Schottky; N-type semiconductors; Non-stoichiometric compounds; Non-stoichiometry; Oxidation reactions; Photoanode; Photoelectrochemical characterization; Photoelectrochemical properties; Photoelectrochemicals; Potential values; Preferential growth; XPS analysis; Electrochemical impedance spectroscopy; Electrochemistry; Electrodeposition; Nanocomposites; Photoelectrons; Scanning electron microscopy; Substrates; Tin; Tin oxides; X ray diffraction; X ray photoelectron spectroscopy; Thin films en_US

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